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. 2021 Jan 20;11(2):266. doi: 10.3390/nano11020266

Figure 2.

Figure 2

FTIR LbL growth of CHIT/GOA assembly conducted on a silicon wafer as substrate (a), 1626 cm−1 plot as function of deposited bi-layer (BL) for all the under-study assemblies (b), CHIT/GOx (c) assemblies.