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Flow chart for Si NW formation by MACE at a temperature of 30 °C on the confined areas by (a) applying AZ5214 photoresist, (b) opening windows from 2 × 2 μm2 to 400 × 400 μm2, and using (c) AgNO3/HF/H2O solution with a concentration ratio of 0.67 g:35 mL:182 mL. (d) Plan-view and (e,f) Cross-sections SEM images of the etched confined areas [67]. This figure [67] is reproduced with permission (open access), Copyright 2011, Springer Nature.
