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. 2021 Feb 5;21(4):1130. doi: 10.3390/s21041130

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© 2021 by the authors.

Licensee MDPI, Basel, Switzerland. This article is an open access article distributed under the terms and conditions of the Creative Commons Attribution (CC BY) license (http://creativecommons.org/licenses/by/4.0/).

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The piezoresistive property test of sputtered MoS2 film: (a) the piezoresistive testing system for thin films; (b) the schematic diagram of the film surface compression: (i) the state of Scheme 2 before pressure; (ii) the state of sputtered MoS2 under pressure; (c,d) pressure test curves of MoS2 films deposited on PDMS substrates with different thicknesses at the power of 350 W; (e) the relationship diagram between the thickness of the substrate and the sensitivity of MoS₂ sputtered on the substrate at 0–0.23 MPa.

The piezoresistive property test of sputtered MoS2 film: (a) the piezoresistive testing system for thin films; (b) the schematic diagram of the film surface compression: (i) the state of Scheme 2 before pressure; (ii) the state of sputtered MoS2 under pressure; (c,d) pressure test curves of MoS2 films deposited on PDMS substrates with different thicknesses at the power of 350 W; (e) the relationship diagram between the thickness of the substrate and the sensitivity of MoS₂ sputtered on the substrate at 0–0.23 MPa.