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. 2021 Mar 3;11:5075. doi: 10.1038/s41598-021-84376-6

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© The Author(s) 2021

Open Access This article is licensed under a Creative Commons Attribution 4.0 International License, which permits use, sharing, adaptation, distribution and reproduction in any medium or format, as long as you give appropriate credit to the original author(s) and the source, provide a link to the Creative Commons licence, and indicate if changes were made. The images or other third party material in this article are included in the article's Creative Commons licence, unless indicated otherwise in a credit line to the material. If material is not included in the article's Creative Commons licence and your intended use is not permitted by statutory regulation or exceeds the permitted use, you will need to obtain permission directly from the copyright holder. To view a copy of this licence, visit http://creativecommons.org/licenses/by/4.0/.

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AFM images of patterns written with various doses in interferometric configuration: (a) 2.5 mJ/cm², (b) 5 mJ/cm², (c) 7.5 mJ/cm², (d) 15 mJ/cm². Period 500 nm. (e) Variation of the pattern height with the dose. (f) Schematic interpretation of the evolution of the pattern structure with the irradiation dose. Initial film thickness 80 nm. The solution has a molar ratio Si/Ti = 6/1 and the MNPs concentration was 0.4 vol%.