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. 2021 Jan 21;77(Pt 1):68–82. doi: 10.1107/S205252062001584X

Table 3. Rietveld refinement of NaOnPr in P4/nmm and P Inline graphic21 m under identical conditions, with restraints on the C and H atoms.

The values marked by a ′ are background-subtracted values. The last column denotes a refinement in P Inline graphic21 m with two sets of propyl groups, one corresponding to the orientation in P Inline graphic21 m and the other rotated by 90°, which is occupied in P4/nmm, but empty in P Inline graphic21 m. N(param) is the number of structural parameters, including the occupancy parameter.

  P4/nmm P Inline graphic21 m P Inline graphic21 m with both orientations of nPr
R wp (%) 5.424 5.654 5.386
R wp′ (%) 17.953 18.714 17.832
R p (%) 4.198 4.376 4.238
R p′ (%) 18.139 18.908 18.324
Goodness-of-fit 1.837 1.915 1.824
N(param) 18 18 18 + 1 (occupancy)
Occupancy p 0.25 (fix) 0.5 (fix) 0.38 (3):0.12 (3)