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. Author manuscript; available in PMC: 2021 Oct 27.
Published in final edited form as: ACS Nano. 2020 Sep 22;14(10):12982–12992. doi: 10.1021/acsnano.0c04266

Figure 4.

Figure 4

Layer-by-layer beam writing tests of overlapping structures in liquid PEGDA polymer solutions. a) An expected sequential writing of the overlapping structures in liquid solutions. b) Model log-pile structure printed with and without anodic potential on the SiN /Pt electrode; c) The morphology of the e-beam printed PEGDA structure depends on the writing sequence 1–2-3–4 for low dose exposure and is independent for saturated crosslinking density; d) Electrochemical size and adhesion control of the in-liquid crosslinked structures: panel A no electrochemical bias (V) is applied. Panel B, with applied cathodic potential V and current density of ca. 20 µA/mm2. Drastic reduction of the feature size and its footprint can be observed.