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Characterization of 3D patterns by numerical optical microscopy obtained by free radical photopolymerization experiment (using TA or TMPTA as benchmark monomer) using a diode laser at 405 nm: (A) CoumC/Iod/4,N-N-TMA (0.05%/0.5%/0.235% w/w/w) in TA, (B) CoumH/Iod/TMA (0.05%/0.5%/0.19% w/w/w) in TMPTA and (C) CoumD/Iod/4,N-N-TMA (0.05%/0.5%/0.275% w/w/w) in TMPTA.
