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The Three Steps and Flow Rates of the Different Gases Used for Processing SiON, SiONP1, and SiONP2 Implants
| SiH4/Ar (15/85%) | PH3/SiH4/Ar (2/15/83%) | N2O | N2 | NH4 | Ar | Time (s) | |
|---|---|---|---|---|---|---|---|
| Step 1 | 0 | 0 | 0 | 0 | 0 | 250 | 30 |
| Step 2 (SiONx) | 24 | 0 | 155 | 225 | 50 | 0 | 226 |
| Step 2 | 0 | 24 | 225 | 50 | 0 | 322 | |
| (SiONPx)1 | 5 | ||||||
| (SiONPx)2 | 16 | ||||||
| Step 3 | 0 | 0 | 0 | 0 | 0 | 250 | 30 |
Ar = Argon (carrier gas); N2 = nitrogen; N2O = nitrous oxide; NH4 = ammonia; PH3 = phosphine; SiH4 = silane; SiON = silicon oxynitride; SiONP = silicon oxynitrophosphide.
