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. 2021 May 5;17(3):325–345. doi: 10.1007/s13273-021-00139-4

Table 1.

Chemicals linked to diseases in each process

Chemical Name CAS No Process in semiconductor Etc
1-Methoxy-2-propyl acetate 108-65-6 Wafer processing, Chip assembly, Photo (PR solvent) Common to all processes
Acetone 67-64-1

Overall process, Wafer processing, Chip assembly,

Mold, Printing, Chip adhesion

Cresol

o-Cresol 95-48-7

p-Cresol 106-44-5

m-Cresol 108-39-4

Wafer processing, Chip assembly, Mold, Photo (PR solvent), Mold
Ethanol 64-17-5 Wafer processing, Chip assembly, Photo (PR solvent), Overall assembly (Cleaning solution)
Hydrogen peroxide 7722-84-1 Wafer processing, Chip assembly, Chip adhesion (liquid), Wet etching, wet cleaning, Plating
Isopropyl alcohol 67-63-0 Wafer processing, Chip assembly, Photo (PR solvent), Cleaning solution (PM etc.), Maintenance, Washing, Diffusion (liquid, Plating etc.)
n-Butyl acetate 123-86-4 Wafer processing, Chip assembly, Photo (PR solvent), Testing etc
Nitric acid 7697-37-2 Wafer processing, Chip assembly, Wet etching, Grinding, Wet cleaning, Plating
Potassium hydroxide 1310-58-3 Wafer processing, Chip assembly, BSG (Grinding), Plating
Sulfuric acid 7664-93-9 Wafer processing, Chip assembly, Wet etching, Wet cleaning, Plating
Tetramethyl ammonium hydroxide

75-59-2

10,424-66-5 (Trihydrate)

10,424-65-4 (Pentahydrate)

Wafer processing, Chip assembly, Photo (developer), Rear Grinding
1-Methoxy-2-propanol 107-98-2 Wafer processing, Photo (PR solvent) Specific to the wafer processing process
2-(2-Aminoethoxy)-ethanol 929-06-6 Wafer processing
2-Ethoxyethanol 110-80-5 Wafer processing, Photo (PR solvent)
2-Heptanone 110-43-0 Wafer processing, Photo (PR solvent)
Catechol 120-80-9 Wafer processing, Photo (PR removal)
Dibutyl ether 142-96-1 Wafer processing, CVD
Ethylene glycol 107-21-1 Wafer processing, Dry etching, CVD, Ion implantation (Past 6 inches)
Gamma-Butyrolactone 96-48-0 Wafer processing, Photo
Methyl-2-hydroxy isobutyrate 2110-78-3 Wafer processing
Methyl-3-methoxy propionate 3852-09-3 Wafer processing, Photo (PR solvent)
Nitric oxide (Nitrogen monoxide) 10,102-43-9 Wafer processing, Diffusion
Phosphoric acid 7664-38-2 Wafer processing, Wet etching
Trimethyl phosphate 512-56-1 Wafer processing, CVD
2-(2-Ethoxyethoxy) ethanol 111-90-0 Chip assembly, Mold Specific to the chip assembly process
2-Butoxyethanol 111-76-2 Overall Chip assembly
Acetaldehyde 75-07-0 Mold, Chip assembly
Acetic acid 64-19-7 Washing, Wet etching, Etching (Wet, liquid), Wafer processing, Washing (Diffusion etc.), Wet etching
Ethyl acetate 141-78-6 Chip assembly, Chip adhesion, Mold, Solder ball attachment, Printing (Ink marking) Cleaning solution etc
Glycerol 56-81-5 Solder ball attachment, Chip assembly
Heptane 142-82-5 Chip assembly, Mold, Photo (developer) etc
Methanesulfonic acid 75-75-2 Chip assembly, Plating
Methyl isobutyl ketone 108-10-1 Chip assembly, Mold etc
N-Methyl-2-pyrrolidone 872-50-4 Chip assembly, Photo (PR removal, developer)
Phenol 108-95-2 Chip assembly, Mold, etc
Piperazine 110-85-0 Chip assembly, Rear grinding
Polyethylene polypropylene glycol 9003-11-6 Chip assembly
Tetrachloroethylene 127-18-4 Mold, Chip adhesion, Chip assembly, Testing
Tetrahydrofuran 109-99-9 Chip assembly, Rear grinding, Solder ball attachment, Mold, etc
Tin(II) methanesulfonate 53,408-94-9 Chip assembly, Plating

The 25 chemicals including 1-Methoxy-2-propanol are in wafer processing, 26 chemicals including 1-Methoxy-2-propyl acetate are in chip assembly