Skip to main content
. Author manuscript; available in PMC: 2022 Feb 8.
Published in final edited form as: J Chromatogr A. 2021 Jan 8;1638:461892. doi: 10.1016/j.chroma.2021.461892

Figure 1.

Figure 1.

(A) SEM of a nanochannel replicated via UV-NIL into a polyurethane (PUA) resin to produce the resin stamp. In this cases, the resin stamp has the reverse polarity compared to the Si master from which it was replicated from. (B) SEM of a nanochannel thermally imprinted into a COC 5010 substrate. (C) AFM of a nanochannel thermally imprinted into COC 5010 with a depth determined to be 110 nm.