Table 1.

Dimensional distribution of the aggregates in the thin films deposited onto Si (Si-10, Si-20, Si-30) and Ti substrates (Ag-TCP-10, Ag-TCP-20, Ag-TCP-30).

	Dmax	Dmin	Mean D	Distribution [%aggregates for each range]
	[nm]	[nm]	[nm]	d < 50 nm	50 nm ≤ d < 100 nm	100 nm ≤ d < 500 nm	d ≥ 500 nm
Si-10	1095	16	132	44 ± 2	28 ± 5	24 ± 8	4 ± 2
Si-20	1787	20	237	14 ± 1	44 ± 14	34 ± 13	8 ± 3
Si-30	1131	17	198	26 ± 5	18 ± 6	44 ± 6	12 ± 5
Ag-TCP-10	830	11	153	53 ± 3	14 ± 5	28 ± 2	6 ± 2
Ag-TCP-20	959	22	167	28 ± 3	33 ± 1	32 ± 3	7 ± 3
Ag-TCP 30	927	22	178	23 ± 5	18 ± 5	53 ± 13	6 ± 1