Figure 4.

Comparison of (i) optical lithography and (ii) brush and BCP lithography. The first stage for both these processes is (a) substrate cleaning. The basic steps for optical lithography illustrated in Figure 4 part (i) and consist of, (b) photoresist deposition, (c) UV exposure, (d) post-baking, (e) development, (f) metal thin film deposition, and (g) polishing and etching [150]. The principal steps for Brush and BCP lithography of polymers are shown in Figure 4 part (ii) and comprise of (b) polymer spin casting, (c) annealing/phase separation, (d) salt infiltration, and (e) UV/ozone [18]. Reprinted (adapted) with permission from ([18]). Copyright (2010) American Chemical Society.