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. 2021 May 3;11(5):1209. doi: 10.3390/nano11051209

Figure 12.

Figure 12

Typical AFM images of flat (100) Si0.72Ge0.28 surfaces before and after the etching process: (a) as–grown; (b) HNO3:HF:H2O mixtures; (c) q-ALE with 50 cycles; (d) q-ALE with 30 cycles.