Table 4. Application Protocols According to the Manufacturer’s Instructions.

sample group	self-etch approach (SE)	etch-and-rinse approach (ER)
CSE	apply primer for 20 s; gently air blow; apply bonding agent; light cure for 10 s
SBU	apply with rubbing action for 20 s, medium pressure air thin for 5 s	etch with 35% phosphoric acid for 15 s, rinse for 15 s and immediately air dry; then, apply as the SE approach
ABU	apply two separate coats with rubbing action for 10–15 s per coat without light-curing in-between, air thin for 10 s	etch with 35% phosphoric acid for 15 s, rinse for 15 s, and immediately air dry; then apply as SE approach
CBQ	apply with rubbing action for 10 s, medium pressure air thin for 5 s	etch with 35% phosphoric acid for 15 s, rinse for 15 s, and immediately air dry; then, apply as SE approach
EX	apply with rubbing action for 20 s, medium pressure air thin for 5 s	etch with 35% phosphoric acid for 15 s, rinse for 15 s, and immediately air dry; then, apply as SE approach