Table 2.

High-throughput nanomaterial interconnection fabrication.

Reference	Material	Method	Substrate	Curing	Printing Speed [m/min]	Sheet Resistance [Ω/sq]	Resolution [µm]
[53]	Graphene	Gravure	PI	Room temperature	0.3	6.25	30
[22]	AgNP	Inkjet	PEN	Laser Sintering	10	2.5	50
[155]	AgNP	Flexography	PET	130 °C for 5 min	5	45	150
[35]	AgNP	Screen	PDMS	140 °C for 8 min	2	2.5	125
[50]	AgNW	Gravure	PET	150 °C for 5 min	1.5 mm/s	~20	50–150
[153]	AgNW	Screen printing	PET	Flash Light Sintering	0.2	9.6	20
[154]	AgNW	Gravure	PEN	170 °C for 10 min	1	9.3	Film was tested
[88]	AgNP	Gravure	PEN	100 °C for 1 min	Not reported, roll-to-roll	4.9	40 mm × 80 mm