Figure 1.

Patterned MoS₂ deposition by a droplet dragging approach. (a) Schematic of the experimental set-up in which a precursor droplet is dragged across the substrate. Depending on the transient shape of the dragged droplet, a variation in the obtained precursor film thickness is obtained (bottom panel). Upper panel: Dragging speed. (b) Optical image of a patterned MoS₂ film prepared by the droplet dragging approach (after annealing, droplet shearing velocity of 67 µm/s, with halts every 200 µm). (c,d) Representative Raman (c) and PL (d) spectra recorded in the dark, border and light MoS₂ regions indicated in (a,b).