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. 2021 Jul 3;14(13):3733. doi: 10.3390/ma14133733

Figure 7.

Figure 7

The TEM image of the epi-Si obtained after wet pre-cleaning and subsequent H2 bake at 750 °C 5 min. (a) TEM image, (b) TEM image of the red box, (c) FFTs of substrate and epitaxial layer showing crystalline structure.