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. 2021 Jan 22;54(3):1203–1215. doi: 10.1021/acs.macromol.0c02543

Figure 7.

Figure 7

SEM images of Si nanowall after pattern transfer. Top-down SEM images of Si nanowall structures following an ICP etch of the iron oxide hard mask for (a) 1 and (b) 3 min etch, with tilted images (70°) shown in (c,d), respectively. (e,f) Cross-sectional SEM image of Si nanowalls for samples (a,b).