Table 1.
SERS Substrates | First Method (A) |
Second Method (B) | Etching Time (min, M) |
Removal of Silver Residues | Re-Immersion Time (s, S) |
---|---|---|---|---|---|
A5M | YES | - | 5 | YES | - |
A30M | YES | - | 30 | YES | - |
A5M3S | YES | - | 5 | YES | 3 |
A5M6S | YES | - | 5 | YES | 6 |
A30M3S | YES | - | 30 | YES | 3 |
A30M6S | YES | - | 30 | YES | 6 |
A30M10S | YES | - | 30 | YES | 10 |
B2M | - | YES | 2 | NO | - |
B3.5M | - | YES | 3.5 | NO | - |
B5M | - | YES | 5 | NO | - |