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. 1994 Sep-Oct;99(5):641–671. doi: 10.6028/jres.099.059

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The Journal of Research of the National Institute of Standards and Technology is a publication of the U.S. Government. The papers are in the public domain and are not subject to copyright in the United States. Articles from J Res may contain photographs or illustrations copyrighted by other commercial organizations or individuals that may not be used without obtaining prior approval from the holder of the copyright.

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Fig. 11 — X-ray mask metrology. (a) Monte Carlo modeled data of the transmitted electron signal and the backscallered electron signal showing the appearance of the characteristic notch in both modes of electron collection; (b) digilized field emission SEM micrograph of the transmitted electron signal demonstraling the presence of the nolch in the experimental data.