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. 2021 Mar 2;7:14. doi: 10.1038/s41378-020-00237-8

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© The Author(s) 2021

Open Access This article is licensed under a Creative Commons Attribution 4.0 International License, which permits use, sharing, adaptation, distribution and reproduction in any medium or format, as long as you give appropriate credit to the original author(s) and the source, provide a link to the Creative Commons license, and indicate if changes were made. The images or other third party material in this article are included in the article’s Creative Commons license, unless indicated otherwise in a credit line to the material. If material is not included in the article’s Creative Commons license and your intended use is not permitted by statutory regulation or exceeds the permitted use, you will need to obtain permission directly from the copyright holder. To view a copy of this license, visit http://creativecommons.org/licenses/by/4.0/.

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Fig. 2 — Hexagonally patterned TiN absorber with multiple-patterning colloidal lithography (MPCL). a Schematic illustration of the process. Highly ordered TiN ring-shaped structures are fabricated using MPCL. Scanning electron microscopy images b of hexagonally packed PS nanospheres monolayer, c after second PS size reduction, d after PS removal, e of final ring-shaped TiN absorber. Inset shows the tilted view of final ring-shaped TiN absorber