Table 2.
Overview of materials patterned by t-SPL with a brief description and the relevant references
| Material | Comment | Ref. |
|---|---|---|
| Removal | ||
| CSAR 62 | A commercial EBL resist which can be directly removed by a heated tip. High contamination of the tip | Personal communication to the author |
| Diels-Alder polymer | Fast (~10 µs) and reversible cross-linking upon heating | 129 |
| Fluorocarbon | Thermomechanical indentation of the thin film (0.5 µm/s) | 130 |
| Diphenylalanine nanotubes | Thermomechanical machining of nanotubes | Personal communication to the author |
| Molecular glasses (various) | Desorbs from substrate upon heating. High resolution possible. Can be deposited by evaporation. | 48–50 |
| Polyaryletherketone (PAEK) | Thermomechanical indentation in highly cross-linked polymer | 15 |
| Polycarbonate (PC) | Cross-linked PC used for thermal degradation with heated tip (0.5–3 µm/s) | 9,46 |
| Pentaerythritol tratranitrate (PETN) | Thermal degradation of an energetic material leading to much wider structures with higher temperatures | 47 |
| Polymethylmethacrylate (PMMA) | Indentation, thermal degradation (10 µm/s) | 8,11–13,51,131,132 |
| PMMA/MA | Serves usually as underlayer for bilayer lift-off but also possible to remove by heated tip | Personal communication to the author |
| Polyphthalaldehyde (PPA) | Most used t-SPL resist, clean decomposition at glass point, sub-10- nm resolution, accurate grayscale and high speed demonstrated | 7,29–31,33,36–39,43,52–77 |
| Polystyrene (PS) | Indentation | 16–18,133 |
| Polysulfone | Ripple formation study | 17,134 |
| Polythioaminal | Resist for sublimation via thermal decomposition | 126 |
| SU-8 | Thermomechanical indentation | 135 |
| Conversion | ||
| 3-mercaptopropyltriethosysilane (MPTES) | Deprotection of THP group (3 µm/s) | 83 |
| Aminopropyltriethoxysilane (APTES) | Surface activation | 83 |
| AZ 5214E | Thermally activated crosslinking (10–20 nm/s) | 87,95 |
| BiFeO3 | Thermally induced crystallization of ferroelectric nanodots from sol–gel prepared film | 100 |
| Co/Pt | Thermally-assisted magnetic recording | 136 |
| CoFe2O4 | Thermally induced crystallization of ferromagnetic nanodots from sol-gel prepared film | 101 |
| GeSbTe | Phase-change material crystallized by 100 ns heat pulses and rapid cooling | 21 |
| GeTe | Crystallization of material upon heating (<1 µm/s) | 98 |
| Graphene | Oxidation of graphene with a heated probe in oxygen-containing atmosphere | 87 |
| Graphene oxide | Thermal reduction of graphene oxide for nanoelectronics | 42,45,86 |
| Graphene fluoride | Thermal reduction of graphene fluoride (10–50 nm/s) | 137 |
| InSnSb | Tip-induced crystallization of phase change material | 9 |
| p(THP-MA)80-p(PMC-MA)20 | Thermal deprotection of functional amine groups, chemical gradients possible (<1.4 mm/s) | 32,33,78–82,138,139 |
| Poly(tert-butyl acrylate) | Thermal deprotection of tert-butyl ester groups uncovers carboxylic acid moities (5–500 µm/s) | 84,85 |
| PbTiO3 / PbZrTiO3 (PZT) | Ferroelectric nanostructures from sol-gel precursor (contact duration 0.6 s) | 99 |
| Pentacene precursor | 13,6-N-Sulfinylacetamidopentacene, for organic nanoelectronics | 88,92 |
| Polyarylenetriazolylene (PArT) precursors | “Click Chemistry” thermally triggered 1,3-dipolar cycloaddition to fabricate organic semiconductors (16 µm/s) | 94 |
| Polyethylene terephthalate (PET) | Crystallization of amorphous PET by thermal annealing with a heated probe | 140 |
| PMMA/BPA/Ag3N | Thermally triggered exothermal reaction, increases accessible temperature | 141 |
| Poly(p-phenyene vinylene) (PPV) precursor | Nanoscale conducting polymer structures from a precursor film (<80 µm/s) | 42,88–91 |
| PVDF-TrFE | Thermally induced crystallization of ferroelectric nanodots | 102 |
| Ru/IrMn/CoFeB | Anti- and ferromagnetic multilayers to fabricate nanoscale magnetic structures | 103–106 |
| TbFe | Thermally-assisted magnetic recording | 136 |
| Titanium | Thermal oxidation with a heated probe | 87 |
| Silk fibroin | Solubility contrast in water by fast melting of beta sheet crystallites | 97 |
| Supramolecular glass | Supramolecular polymers can reversibly form aggregates upon heating | 96 |
| Addition | ||
| Cu, CuO | Tip-based chemical vapor deposition from copper acetylacetonate precursor | 124,125 |
| Indium | Direct fabrication of indium oxide nanowires | 116 |
| Mercaptohexadecanoic acid (MHA) | Study of temperature dependence of ink transport | 109 |
| Octadecylphosphonic acid (OPA) | Self-assembled monolayer (1 µm/s) | 111 |
| Poly(3-dodecylthiophene) (PDDT) | Deposition of self-assembled monolayers of a conducting polymer (10 µm/s) | 112–114,117 |
| Polyethylene (PE) | Direct deposition as etching mask and carrier of nanoparticles | 108,117 |
| Poly(N-isopropylacrylamide) (PNIPAAm) | Deposition of functional polymer | 115 |
| Poly(methyl methacrylate) (PMMA) | Use as a mask for XeF2 etching of MoS2 nanoribbons | 120 |
| Polystyrene (PS) | Use as a mask for dry etching | 110,118,121,122 |
| PVDF-TrFE | Direct deposition of a ferroelectric polymer with and without metalorganic additives | 117 |