REAGENT or RESOURCE | SOURCE | IDENTIFIER |
---|---|---|
Other | ||
h-BN | HQ graphene | https://www.graphene-info.com/hq-graphene |
MoS2 | HQ graphene | https://www.graphene-info.com/hq-graphene |
Polydimethylsiloxane | Metatest Corporation | https://www.metatest.cn/ |
p++ doped silicon wafers | Suzhou Crystal Silicon Electronic & Technology Co., Ltd | http://www.szjxtech.com/ |
Atomic layer deposition | Beneq | https://beneq.com/zh/ |
Electron beam lithography | JEOL company | http://www.jeol.com.cn/ |
Electron beam evaporation | EBE JSD500 | |
AFM | Oxford Instruments | https://www.oxinst.com/products |
Scanning electron microscope | JEOL company | http://www.jeol.com.cn/ |
Cascade Summit 11000 type | KEYSIGHT | https://www.keysight.com/us/en/home.html |
Software and algorithms | ||
OriginPro 2021b | OriginlLab Corporation | https://www.originlab.com/ |