Table 3. Percentage contributions of inter­atomic contacts to the Hirshfeld surface for the title compound (1).

Contact	Percentage contribution
H⋯H	36.8
Cl⋯H/H⋯Cl	26.6
C⋯H/H⋯C	18.8
O⋯H/H⋯O	11.3
Cl⋯C/C⋯Cl	4.4
Cl⋯O/O⋯Cl	0.8
Cl⋯Cl	0.8
O⋯C/C⋯O	0.4
C⋯C	0.1