Table 2.

Electrode materials for cathode

No	Name	Composition of electrodea)	Potential (V vs Li+/Li)	Specific capacity [µAh cm−2µm−1]	Deposition method/temperature [°C]	Refs.
1	Titanium oxysulfide	TiOS	2.25		dc‐reactive sputtering/T r	[ 206 ]
2	Titanium oxysulfide	TiSi x O y			rf‐sputtering/T r	[ 174 ]
3	Titanium sulfide	TiSi2	2.5		rf‐sputtering/T r	[ 175 ]
4						[ 207 ]
5	Silver iodide	AgI	2.1			[ 3 ]
6	Lithium cobalt oxide	LiCoO2	3.5–3.9		PLD/T r, postannealed 400–850	[ 208 ]
7		LiCoO2	3.5	50	PLD/T r, postannealed 800	[ 208 ]
8		LiCoO2 LiCo1‐ x Al x O2	3.8		PLD / 300–700	[ 209 ]
9		LiCoO2		200 mAh g−1	rf‐sputtering/ <180 (amorphous)	[ 210 ]
10		LiCoO2 (LE) LiCo1‐ x Al x O2 (LE)		89 mAh g−1 89/3 mAh g−1	PLD/700 PLD/600	[ 211 ]
11		LiCoO2 (LE)	3.5	195 mC cm−2 µm−1	PLD/100–300	[ 212 ]
12			3.9		PLD	[ 213 ]
13				52.5	rf‐sputtering (350 °C) with rf plasma treatment	[ 214 ]
14				60	rf‐sputtering/up to 500	[ 215 ]
15				48	Sol‐gel, annealed 600–800	[ 199 ]
16				67	rf‐sputtering/T r, postannealed 500	[ 216 ]
17		LiNi0.8Co0.2O2	3.7	89 mAh g−1	PLD/500–900, postannealed 1000	[ 217 ]
18	Lithium nickel‐manganese‐cobalt oxide	Li(Ni x Mn y Co z )O2 (LE)	4.2–3.9	164 mAh g−1	rf‐sputtering / postannealed 700	[ 218 ]
19
20		Li(Ni x Mn y Co z )O2	3.8–3.5	33
21		Li(Ni1/3Mn1/3Co1/3)O2		177 mAh g−1	PLD/ postannealed 450	[ 219 ]
22	Lithium‐rich nickel‐manganese‐cobalt oxide	xLi2MnO3‐(1‐x) Li(Mn0.375Ni0.375Co0.25)O2 (LE)	4.5–2		Spin coat/postannealed 450	[ 220 ]
23		Li[Li0.2Mn0.54Co0.13Ni0.13]O2		45	rf‐sputtering/T r, post annealed 450–600	[ 221 ]
24		LiCoBO3 (LE)	3.5–2.5			[ 222 ]
25		Li1+ x V3O8	2.9		Li1+ x V3O8‐polyethylene oxide composite	[ 223 ]
26		Li1+ x V3O8 (LE)	3.8–1.5	250 mAh g−1	rf‐sputtering (mixed amorphous and crystalline)	[ 224 ]
27		LiV2O5	3.5	30	Plasma enhanced chemical vapor deposition/250	[ 225 ]
28	Lithium manganese oxide	LiMn2O4 (LE)	4.0		rf‐sputtering/T r, postannealed 650–800	[ 207 ]
					rf‐sputtering/T r, postannealed 400	[ 226 ]
					PLD / 500	[ 227 ]
29		LiMn2O4	4.2	50	Reactive electron beam evaporation/50 (substrate), postannealed 800	[ 228 ]
30				47	rf‐sputtering/T r, postannealed 750	[ 229 ]
31			4.1–3.9	80 mAh g−1	rf‐sputtering/T r, postannealed 750	[ 230 ]
32		Li x Mn2‐ y O4 (LE)	4.1–3.9	121 mAh g−1	rf‐sputtering/T r with bias	[ 231 ]
33		LiMn2O4 (LE)	4.1		rf‐sputtering/T r, postannealed 700	[ 232 ]
34					Sol‐gel combined with oxygen‐plasma irradiation/ 723, 973 K	[ 233 ]
35					Chemical solution deposition/postannealed 500–750	[ 234 ]
36			4.0, 3.0	1.2 Ah cm−3	rf‐sputtering/T r, postannealed 800	[ 236 ]
37		LiSn0.0125Mn1.975O4 (LE)	4.2	68	rf‐sputtering/T r, postannealed 500	[ 235 ]
38		LiMn2O4/SrRuO3 (LE)	4.1	125 mAh g−1	PLD/650	[ 237 ]
39	Lithium nickel manganese oxide	LiNi0.5Mn1.5O4 (LE)	4.7	155 mAh g−1	Electrostatic spray deposition/450, postannealing 700	[ 238 ]
40			4.7	45	Sol‐gel/post annealed 500–700	[ 239 ]
41			4.8	120–155 mAh g−1	PLD/600	[ 240 , 241 , 242 , 243 , 244 , 245 , 246 ]
42			5 & 4	120 mAh g−1	rf‐sputtering/T r,	[ 247 ]
43			4.7	50	rf‐sputtering/T r, postannealed 700 or 750	[ 248 ]
44			4.7	104 mAh g−1	rf‐sputtering/T r, post annealed 600	[ 249 ]
45		LiNi0.5Mn1.5O4	4.8		PLD/ 500, 650	[ 250 ]
46		LiCoMnO4 (LE)	5	110 mAh g−1	PLD/500	[ 251 ]
47	Lithium iron phosphate	LiFePO4 (LE)	3.4		PLD/Tr , postannealed 773 K	[ 252 ]
48				160 mAh g−1	PLD/600	[ 253 ]
49					PLD/500	[ 254 ]
50				33	rf‐sputtering/T r, 500	[ 255 ]
51				56	rf‐sputtering/up to 500	[ 256 ]
52	Lithium cobalt phosphate	LiCoPO4	4.8		rf‐sputtering/T r, postannealed 300–700	[ 257 ]
53	Vanadium pentoxide	V2O5	3.7		dc sputtering/T r	[ 207 ]
54			3–2	43	Thermal evaporation	[ 258 ]
55		V2O5 (LE)	3.4		PLD/T r, 500	[ 211 ]
56					ALD / postannealed 400	[ 259 ]
57	Mangenues dioxide	MnO2	3		rf‐sputtering/T r, postannealed up to 450	[ 260 ]
58	Molybdenum oxide	MoO3‐ x	3–1.9	85	rf‐sputtering/100	[ 261 ]
59	Molybdenum oxysulfide	MoS x O y	2.4–1.3		Electrochemical deposition	[ 262 ]

^a)ATFBs were tested based on full cells unless otherwise stated as “LE” indicating half‐cell using the liquid electrolyte.