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. 2021 Oct 9;10(10):2137. doi: 10.3390/plants10102137

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© 2021 by the authors.

Licensee MDPI, Basel, Switzerland. This article is an open access article distributed under the terms and conditions of the Creative Commons Attribution (CC BY) license (https://creativecommons.org/licenses/by/4.0/).

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Germination percentages of two wheat genotypes during 4 days under control (C), salt treatments (90, 160 and 230 mM NaCl), high voltage electrical discharge (HVED) pretreatment (P) and combined (P-90 mM NaCl, P-160 mM NaCl and P-230 mM NaCl) treatments. Values are means of three repetitions (100 seeds/repetition) ± S.D. The different capital letters indicate significances among means of different treatments within the same genotype, while lowercase letters indicate significances among means between genotypes under the same treatment at p < 0.05 using LSD post hoc-test.