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. 2021 Sep 27;12(10):1159. doi: 10.3390/mi12101159

Figure 6.

Figure 6

(a) Schematic cross-section of the typical epitaxial layer structure used for the manufacture of GaN-on-Si HEMTs. (b) TEM image of a GaN/AlN superlattice buffer layer and (c) a step graded AlGaN buffer layer, both on Si substrates [12].