Heat map showing log2 fold change in differentially expressed genes in Rev3l
+/+ and Rev3l
−/− MEFs from 2 independent biological experiments (Rev3l+/+: samples 1 and 2, Rev3l−/−: samples 5 and 6) with 2 technical replicates (samples 3,4,7,8: technical repeats from samples 1,2,5,6, respectively). Several developmentally regulated genes and imprinting genes (paternally in blue and maternally in pink) down‐regulated in Rev3l
−/− MEFs are indicated on the right. Yellow and blue indicate high and low mRNA expression levels, respectively.
Top five biological process gene ontology (GO) terms of genes found down‐regulated in Rev3l
−/− MEFs transcriptome analysis.
Volcano plot shows in red genes involved in development and imprinting with high fold changes ≥ 3 (FDR < 0.05).
Relative mRNA levels of four genes involved in development (Hoxb2, Hoxb8, Hoxb9, and WT1) were validated through qRT–PCR from Rev3l
+/+ and Rev3l
−/− MEF samples. The data were normalized to the amount of GAPDH mRNA. Error bars indicate standard error of the mean for three independent experiments. ***P < 0.001 and **P < 0.005 by Student’s t‐test.
Relative mRNA levels of genes involved in imprinting (paternal expressed genes: Dlk1 and Slc18a4 and maternal expressed genes: Dcn1 and H19) were validated through qRT–PCR from Rev3l
+/+ and Rev3l
−/− MEF samples. The data were normalized to the amount of GAPDH mRNA. Error bars indicate standard error of the mean for three independent experiments. ***P < 0.001 by Student’s t‐test.