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. 2021 Oct 16;24(11):103313. doi: 10.1016/j.isci.2021.103313

Figure 1.

Figure 1

Direct laser writing of programmable patterned MoS2 film

(A) Flow diagram of direct laser writing, a laser-directed synthesis of MoS2 on SiO2/Si wafer.

(B–E) Photographs of the 2-inch SiO2/Si wafer after plasma cleaning, baking, laser writing, and rinsing process, respectively.