Table 1.

Summarize of the conditions used in the a-Si thin films deposited.

Code Sample	Substrate Temperature (°C)	RF Power (W)	Pressure (Pa)
A 1	RT	525	1.1
A 2	RT	525	3.2
A 3	RT	525	4.5
B 1	325	450	0.7
B 2	325	450	1.6
B 3	325	450	2.7
B 4	325	450	4.0