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. 2021 Nov 12;77(Pt 12):1280–1284. doi: 10.1107/S2056989021011749

Table 2. Percentage contributions of inter­atomic contacts to the Hirshfeld surface of the title compound.

Contact Percentage contribution
H⋯H 51.2
O⋯H/H⋯O 17.9
C⋯H/H⋯C 15.2
C⋯C 8.1
N⋯C/C⋯N 4.2
N⋯H/H⋯N 1.9
O⋯C/C⋯O 0.9
N⋯N 0.6
O⋯O 0.1