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. 2021 Jan 21;11(7):3952–3962. doi: 10.1039/d0ra07529a

The main technological parameters of Ni nanowires in PAAM.

Sample no Membrane thickness, HPAAM, μm Ni NWs length, L μm Aspect ratio, a.r. Current density, j, mA cm−2 Deposition duration, t, min Mass of deposited Ni, mMe, mg cm−2 Specific deposition rate, vm, mg cm−2 min−1
1 70 5.5 70 1.5 120 4.39 0.033
2 75 6.0 80 2.0 240 8.29 0.034
3 55 10.0 140 3.0 240 15.00 0.062
4 55 12.0 170 4.0 240 17.27 0.072