Table 1.
Treatments | DW% | MC% | RWC |
---|---|---|---|
Control | 10.169 ± 0.508 d | 89.831 ± 4.492 a | 86.179 ± 4.309 b |
80 μM CuSO4 | 25.806 ± 1.290 b | 74.194 ± 3.709 b | 37.097 ± 1.855 e |
160 μM CuSO4 | 34.783 ± 1.739 a | 65.217 ± 3.261 c | 27.273 ± 1.364 f |
KIN | 8.511± 0.426 e | 91.489 ± 4.574 a | 91.489 ± 4.574 ab |
80 μM CuSO4 + KIN | 8.642 ± 0.432 de | 91.358 ± 4.568 a | 77.083 ± 3.854 c |
160 μM CuSO4 + KIN | 16.667 ± 0.833 c | 83.333 ± 4.167 a | 49.180 ± 2.459 d |
BAP | 8.421 ± 0.421 e | 91.579 ± 4.579 a | 93.548 ± 4.677 a |
80 μM CuSO4 + BAP | 9.001 ± 0.450 de | 91.002 ± 4.550 a | 88.349 ± 4.417 ab |
160 μM CuSO4 + BAP | 9.211 ± 0.461 de | 90.789 ± 4.539 a | 76.667 ± 3.833 c |