Fig. 6.

For a representative patient, relationship between genioplasty segment movement (UH, UV, θ) and the horizontal (a–c) and vertical (d–f) displacement of the most affected cephalometric landmarks (highlighted in Fig. 5 with oblique bars) throughout all design points simulated. Two design points having high (blue) and low (red) input values were selected for each input parameter and the simulated postoperative chin shape is shown on the left (g–i) with matching silhouette color; the arrows highlight the positive direction of the displacement (posterior for the horizontal displacement, cranial for the vertical displacement) and rotations (counterclockwise)