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. 2021 Dec 22;12(1):19. doi: 10.3390/nano12010019

Figure 8.

Figure 8

lnJ versus V characteristics, measured at 298 and 77 K, of MIS structures with ZnO:N films deposited at Ar:O2:N2 = 50:10:40 (sample 2.1) (a) and after RTA at 550 °C (sample 2.3) (b).