Table 1.

Technological conditions and corresponding sample number of ZnO:N films with the given layer’s thickness.

ZnO:N Sample Number	Gas Mixture of Ar:O2:N2(%)	RTA Temperature (°C)	ZnO:N Film Thickness (nm)
1.1	50:40:10	as-deposited	214.8
1.2		400	183.8
1.3		550	185.7
2.1	50:10:40	as-deposited	206.6
2.2		400	180.7
2.3		550	202.2
3.1	50:25:25	as-deposited	106.4
3.2		400	127.0
3.3		550	124.4