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. 2022 Jan 6;12(2):182. doi: 10.3390/nano12020182

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© 2022 by the authors.

Licensee MDPI, Basel, Switzerland. This article is an open access article distributed under the terms and conditions of the Creative Commons Attribution (CC BY) license (https://creativecommons.org/licenses/by/4.0/).

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Cross sectional HR-TEM (a) and HAADF-STEM (b) images of few-layers MoS₂ obtained by sulfurization of the ~2.8 nm MoO₃ film on the SiO₂ substrate. MoS₂ is composed by nearly horizontally aligned 2–3 layers. The interlayer spacing in a 3-layers region is evaluated from the HR-TEM in the insert of panel (a). Cross sectional HR-TEM (c) and HAADF-STEM (d) of multilayers MoS₂ obtained by sulfurization of the ~4.2 nm MoO₃ film.