Figure 2.

SU-8 microstructures generated using maskless photolithography on glass substrates. (A) Graph of obtained SU-8 layer thickness against the used spin coating speed. (B) Digital photomask design that was used for backside UV exposure using the PRIMO system and a 5X objective. (C) SEM images of 50 µm tall structures of various geometries that were microfabricated with high accuracy, as evident by the sharp edges and high reproducibility. (D) SEM image of more complex structures. These large structures were generated by the auto-stitching feature of the system, enabling the generation of large and continuous structures. (E) SEM image showing that whole arrays of microstructures can be microfabricated in large areas on the substrates. (F) SEM image of properly developed SU-8 that was exposed to inverted patterns. (i) SU-8 structures to generate pillars for hydrogel patterning. (ii) Acute angles are properly developed.