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. 2022 Feb 18;71(Suppl 1):i23–i29. doi: 10.1093/jmicro/dfab044

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© The Author(s) 2022. Published by Oxford University Press on behalf of The Japanese Society of Microscopy.

This is an Open Access article distributed under the terms of the Creative Commons Attribution License (https://creativecommons.org/licenses/by/4.0/), which permits unrestricted reuse, distribution, and reproduction in any medium, provided the original work is properly cited.

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Fig. 2. — Masks used for particle subtraction and focused classification. Side (left) and top (right) views of masks overlay with ribbon diagrams of TRPV1 structures with RTX/DkTx (upper row, 5IRX) and with CPZ (lower row, 5IS0) bound. Masks cover the transmembrane domain of a monomer subunit. The black mesh shows the extent of the soft edge. The RTX/resting mask was made to exclude the DkTx by the selectivity filter. The CPZ/resting mask is the same as the RTX/resting mask but extended by 10 pixels.