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(a) The inverted topography of the 16 nanoscale hole array with 55 nm periodicity. (b) An image of the channel barrier and insulated gate. (c) The process of a single-electron transistor fabrication using the mixture of the mechanical approach based on AFM fabrication, dry etching, and lift off. Reprinted with permission from Ref. [134]. Copyright 2022 AIP Publishing.
