Table 2.
Technic | Experimental Parameters | Substrate | Chemical Composition | Crystalline Properties | Morphology | Optical Properties | Ref. | |
---|---|---|---|---|---|---|---|---|
Target | Material | T° | ||||||
sputtering | 60 W; 0.13 Pa O2: 02% |
Glass | 164° | 0.048 < O/ (S + O) < 0.82 |
Hexagonal structure of the mesh parameter with O | Granular surface Grains < 50 nm |
- | [41] |
ZnS | ||||||||
sputtering | 1 W/cm2; 1.33 Pa; O2: 01% |
Glass | No | 0.2 < O/ (S + O) < 0.95 ZnO0.05S0.95ZnO0.71S0.29 |
Of the mesh parameter and the intensity of O no diffractyion at the strong % O | Granular surface cracking at high% O | - | [42] |
ZnS | ||||||||
sputtering | 2 W/cm2; 0.9 Pa; O2: 02.5% |
CIGS quartz | 200° | ZnSZnO | Hexagonal structure of the mesh parameter with O | - | T≈70% 2.6 < Eg < 3.6 eV b = 3 |
[43] |
ZnS | ||||||||
sputtering | 300 W; Ar/O2: 1.14.6% |
saphir | 340° | ZnOZnO0.6S0.4 | Hexagonal structure of the mesh parameter with O | crystallites size: 60–70 nm | 2.6 < Eg < 3.6 eV b = 3 |
[44] |
ZnS | [45] | |||||||
sputtering | 300 W | ZnSZnO | - | - | 2.7 < Eg < 3.2 eV b = 3.1 |
[35] | ||
ZnS | ||||||||
Co-pulverisation | PZns = 45 W; PZnO: 0120 W |
Si quartz | 200° | 0 < O/ (S + O) < 0.88 |
Hexagonal structure of the mesh parameter with O | Grains; crystallites < 120 nm | T≈80 2.7 < Eg < 3.1 eV |
[46] |
ZnS and ZnO | ||||||||
Co-pulverisation | 0.07 Pa; PznS = 45 w; PZnO: 20120 W |
0.03 < S/ Zn < 0.90 |
||||||
ZnS and ZnO |