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. 2022 Mar 2;12(5):840. doi: 10.3390/nano12050840

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© 2022 by the authors.

Licensee MDPI, Basel, Switzerland. This article is an open access article distributed under the terms and conditions of the Creative Commons Attribution (CC BY) license (https://creativecommons.org/licenses/by/4.0/).

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A comparison of conventional (a) 90° and (b) 30° dipping mechanisms of upstroke and downstroke of different hydrophobic and hydrophilic substrates. The SEM images show the comparison of the GO film formations in the upstroke (c,f) hydrophilic and (d,g) hydrophobic substrates of Au at both 90° and 30°. (e,h) SEM film formations as a result of downstroke using a hydrophobic Au substrate. Reprinted with permission from the Journal of the American Chemical Society, copyright 2015, American Chemical Society [44].