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Deposition conditions in forming NPG thin film with different porosities on SiO2 vertical microcavity wafer.
| Group | Designed Porosity | Rate of Deposition (A/s) | Deposition Time (s) | |
|---|---|---|---|---|
| Ag | Au | |||
| 1 | 0 | 0 | 0.50 | 500 |
| 2 | 10% | 0.05 | 0.45 | 500 |
| 3 | 20% | 0.10 | 0.40 | 500 |
| 4 | 40% | 0.20 | 0.30 | 500 |
| 5 | 60% | 0.30 | 0.20 | 500 |
