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Data of materials deposition by the magnetron sputtering method on the AFM tips.
| Deposited Material | Argon Gas Pressure (mbar) |
Final Pressure (mbar) |
Voltage (V) |
Temperature (°C) |
Deposition Rate (Å/s) | Target-Substrate Distance (mm) |
|---|---|---|---|---|---|---|
| Gold | 6.4 × 10−3 | 2.5 × 10−5 | 500 | 54 | 2.43 | 130 |
| Titanium | 6.4 × 10−3 | 2.5 × 10−5 | 750 | 54 | 1.7 | 130 |
