Table 5.

Effect of the supporting electrolyte on the yield of the reduction products 3a and 4^a.

Entry	Supporting electrolyte	Yield of 3a (%)b	Yield of 4 (%)b
1	n-Bu4N∙ClO4	47	33
2	Et4N∙ClO4c	–	–
3	n-Hex4N∙ClO4	39	18

^aExperimental conditions: cathode, GC plate; anode, Pt plate; electricity, 2.15 F mol⁻¹; current density, 12.7 mA cm⁻²; electrode distance, 40 μm; solvent, THF; substrate, 0.06 M benzylideneaniline (1) and 1,4-dibromobutane (2a); concentration of supporting electrolyte, 0.14 M; flow rate, 11 mL h⁻¹ (residence time, 3.9 s). ^bDetermined by HPLC. ^cEt₄N∙ClO₄ did not dissolve in THF solution.