Fig. 1. (a) Optical microscopy image of MoS2 films as deposited on Si/SiO2 substrate without O2. (b) Schematic of adsorption and desorption of gaseous phase MoO3 on Si/SiO2. (c) Optical microscopy image (taken after scratch the film gently by tweezer) of in situ O2 processed samples. (d) Camera image of wafer scale continuous MoS2 on Si/SiO2 (in right) and a blank Si/SiO2 substrate (in left) for the reference.
