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. 2022 Apr 8;9:16. doi: 10.1186/s40580-022-00306-w

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© The Author(s) 2022

Open AccessThis article is licensed under a Creative Commons Attribution 4.0 International License, which permits use, sharing, adaptation, distribution and reproduction in any medium or format, as long as you give appropriate credit to the original author(s) and the source, provide a link to the Creative Commons licence, and indicate if changes were made. The images or other third party material in this article are included in the article's Creative Commons licence, unless indicated otherwise in a credit line to the material. If material is not included in the article's Creative Commons licence and your intended use is not permitted by statutory regulation or exceeds the permitted use, you will need to obtain permission directly from the copyright holder. To view a copy of this licence, visit http://creativecommons.org/licenses/by/4.0/.

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Fig. 2 — Detailing the specifics of the novel sequential edge guided patterning mechanism. A A graph of the solution space of dimensions required for utilizing the wedge to rail capillary flow mechanism to sequentially pattern a primary central and secondary side rail utilizing the same wedge, for up to three (one central and two side) patterns within a unit chip. B Illustrates the success and failure conditions for patterning. The green circle denotes a successful 1st center rail and 2nd side rail patterning. The yellow triangle shows a successful 1st center rail patterning, but a failed 2nd side rail pattern due the inability for the 2nd pattern to fill the side rail. The red x denotes a 1st center rail pattern failure. C Shows a rendering of a successful 1st center rail patterning utilizing the optimized dimensions of the platform. D Shows a rendering of a successful 2nd side rail patterning utilizing the optimized dimensions of the platform