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. 2022 Mar 31;12(7):1165. doi: 10.3390/nano12071165

Figure 3.

Figure 3

(a) XRD pattern of the as-deposited TiO2 film on FTO substrate, formed by nanofluid pool boiling. (b) XRD pattern of the heat-treated sample at 250 °C. The ramping rate and period of the temperature were 1 °C/min, 1 h, respectively. (c) XRD pattern of the sintered sample at 550 °C. The ramping rate and period of the temperature were 15 °C/min, 1 h, respectively. (d,e) present the database of SnO2 (JCPDS: 00-046-1088) and TiO2 (JCPDS: 00-021-1272), respectively.