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SEM images of the surface of TiO2 films after nanofluid pool boiling, where the post sintering strategies have been changed. Sintering strategies (maximum temperature, ramping rate, and the period of maximum temperature): (a) without sintering, (b) 250 °C, 1 °C/min, 1 h, (c) 300 °C, 1 °C/min, 6 h. Particle size distributions of the nanoparticles were also presented.
