Figure 34.
Comparison between sintered SiNN coated by (A,C) natively grown silicon dioxide and passivated by (B,D) alumina deposited using ALD. (A, B) Refer to top-view SEM images of nanonets, while (C, D) are sectional schemes of three coated SiNWs: one sectioned in the length and two according to the diameter. For (C), the mean and standard deviation of SiNW length (LSiNWs) and diameter (DSiNWs) are indicated. For (D), due to conformal coating with ALD, alumina is deposited simultaneously on SiNWs and onto the substrate whereas SiNW–SiNW junction and underneath SiNW portions are considered alumina-free. Reproduced from [47].